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Core Facility "Functional Processing"

The Core Facility 2 – Functional Processing is an asset for the research projects at FIT. It provides technical support for design and manufacturing of multifunctional and intelligent biomimetic polymer multilayer systems. These systems can be applied in biochemical, diagnostic, bioinspired energy harvesting and micro-optical sensor applications.

The available modules are designed for processing multi-layer systems and allow flexible combinations of the individual process steps. Sample dimensions from a few square centimeters to large-scale roll-to-roll foil formats can be handled.

The Core Facility’s service is available to researchers at Freiburg University working in projects without industry participation. Device fees apply (information is currently being updated).  

The equipment at the Core Facility 2 is divided into two categories according to operational complexity. For equipment in category 1, evaluated applicants receive training by the Core Facility’s staff, after which they are issued a permit to work on the systems. For category 2, users are not allowed to work alone on the systems; the equipment is operated by the Core Facility’s trained staff.

For further information on the technical support from the Core Facility 2, please contact Prof. Dr. Claas Müller or Dr. Jing Becker

Category 1: Equipment

Electrophoretic deposition (EPD): Permatecs EPD system and cryomill system

  • Pore-free, highly adhesive coatings with functional layers of polymers, ceramics, metals, and combinations thereof.
  • Max. voltage: 3000 V, curing temperature: 450°C


Roll-embossing and lamination: Stork roll laminator HRL 350 Jumbo

  • Roll-to-roll nanoimprinting and foil lamination with smooth or structured rolls and adjustable lamination speed.
  • Max. temperature: 200°C, max. force: 6 bar


Microscope: Zeiss SteREO Discovery.V12

Category 2: Services by the Core Facility’s trained staff

Screen printing: Thieme screen printer LAB 1000

  • Screen printing with polymers, metals and ceramics with accurate automatic alignment on pre-structured substrate.
  • Alignment accuracy: 5 μm, lateral accuracy: 15 μm


Aerosol jet printing: Neotech AMT AJ 15XA aerosol jet print system

  • Mask-less aerosol deposition of functional nanomaterials inks (metals, polymers, ceramics, oxides, biomaterials, …)
  • Resolution: 10 μm


Thin film deposition and surface modification: Plasma Electronic Porta 400

  • Roll-to-roll film deposition and surface modification, such as hydrophobization or hydrophilization, for large-scale flexible substrates. The manufacturing system combines physical vapor deposition (PVD), chemical vapor deposition (CVD), and plasma-enhanced chemical vapor deposition (PECVD) techniques for deposition of metals, oxides, nitrites and carbides.  
  • max. foil dimensions: 1000m x 240mm. min. foil thickness: 40 μm


Nano- & micro structure replication: Jenoptik Hex04 embossing machine

  • Force- and distance controlled hot-embossing nanoimprint lithography (HE-NIL) of thermoplastic polymers at temperatures up to 450°C, using metal and elastomer stamps.
  • max. force: 400 kN, max. roughness: 10 nm
  • UV- nanoimprint lithography (UV-NIL) for photoresists and hybrid polymers with hard and soft stamps.
  • Alignment accuracy: 2 μm, max. substrate dimensions: 300 mm diameter



Core Facility 2 Scientific Head Prof. Dr. Claas Müller


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